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A light-sensitive film used in photolithography and photoengraving.
A positive photoresist example, whose solubility would change by the photogenerated acid. The acid deprotects the tert-butoxycarbonyl (t-BOC), inducing the resist from alkali-insoluble to alkali-soluble. This was the first chemically amplified resist used in the semiconductor industry, which was invented by Ito, Willson, and Frechet in 1982.
A light-sensitive film used in photolithography and photoengraving.
An example of single-component positive photoresist